http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8062986-B2

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grantDate 2011-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b95292a11c0572f0def38110deffb9e7
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publicationDate 2011-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8062986-B2
titleOfInvention Fused silica having low OH, OD levels and method of making
abstract A fused silica article having a combined concentration of hydroxyl (OH) and deuteroxyl (OD) concentration of less than 10 parts per million (ppm) and, in one embodiment, less than 1 ppm. The fused silica article is formed by drying a soot blank in a halogen-free atmosphere comprising carbon monoxide. The dried soot blank may optionally be doped to reach target levels of OH and OD concentrations and improve homogeneity within the fused silica article. The dried soot blank is then oxidized and, sintered to form the article. A method of reducing the combined concentration of OH and OD to less than 10 ppm is also described.
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Total number of triples: 61.