| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-403
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45561
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45531
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00 |
| filingDate |
2004-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2011-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b12cc3c9a5aa84631bfe155af150e82e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aea9e44e1728f6875d2cc832ff4ceeca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_169b8d6980a6788ad51d3266b62da7b5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d81edbfb0bd232f90fee4c6059ab81e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fcebc92749839889c9881bc070874110
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06607fee59ba09fbcf5bcd2c1c0da7cc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01574277d3d822aec6cf0863856d4189 |
| publicationDate |
2011-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8039054-B2 |
| titleOfInvention |
Layer deposition methods |
| abstract |
A layer deposition method includes: feeding a reactant with a first flow of an inert gas as a carrier gas into a reaction chamber to chemisorb the reactant on a substrate; feeding the first flow of the inert gas to purge the reaction chamber and a first reactant feed line; and feeding the second flow of the inert gas into the reaction chamber through a feed line different from the first reactant feed line. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8728239-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013029496-A1 |
| priorityDate |
2003-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |