Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1eb9cd2af2f87dcf20b0fbbdfe79996e |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31612 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-402 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-469 |
filingDate |
2010-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2011-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abe8632e6f766ad5c371e6cbb70dbf74 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_add4d425dd352eacdd414d116303a832 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d5835a5f661834c95cc3f985e36c9c6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb1760aeabc33b1e6499e78231399dc3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a67ca69a2aaf93b8eb159266f06e80e1 |
publicationDate |
2011-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-8034725-B1 |
titleOfInvention |
Method of eliminating small bin defects in high throughput TEOS films |
abstract |
This invention provides a high throughput PECVD process for depositing TEOS films in a multi-station sequential deposition chamber. The methods significantly reduce the number of particles in the TEOS films, thereby eliminating or minimizing small bin defects. The methods of the invention involve dedicating a first station for temperature soak while flowing purge gas. Stopping the flow of reactant gas and flowing the purge gas for station 1 eliminates TEOS condensation on a cold wafer surface and significantly reduces the number of defects in the film, particularly for short temperature soaks. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015048487-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9328416-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9371430-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9570289-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9548188-B2 |
priorityDate |
2006-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |