http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8029875-B2

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filingDate 2007-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2011-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8201722fd87d2e1d5c33e48803fbaa4a
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publicationDate 2011-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8029875-B2
titleOfInvention Plasma immersion ion processing for coating of hollow substrates
abstract The present disclosure relates to a method for plasma ion deposition and coating formation. A vacuum chamber may be supplied, wherein the vacuum chamber is formed by a hollow substrate having a length, diameter and interior surface. A plasma may be formed within the chamber while applying a negative bias to the hollow substrate to draw ions from the plasma to the interior surface of the hollow substrate to deposit ions onto the interior surface and forming a coating. The coating may have a Vickers Hardness Number (Hv) of at least 500.
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