| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b822ee046eb6c45d1e3bd9ce9c1782e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-12 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-10 |
| filingDate |
2009-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2011-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_078337a9813170040094c90aa73f3ede
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef72558c2cc96e622c6c6ddde673fc81 |
| publicationDate |
2011-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7993945-B2 |
| titleOfInvention |
Method for manufacturing light-emitting device |
| abstract |
An object is to provide a method for manufacturing a light-emitting device with high definition, high light-emitting characteristics, and the long lifetime by employing a method in which a desired evaporation pattern can be formed and an excess evaporation of a material layer which is to be the transfer layer is prevented and in which deterioration of the material or the like is hard to occur in a transfer step. This is a method for manufacturing a light-emitting device, in which irradiation with first light is performed to pattern a material layer over a first substrate which is an evaporation donor substrate and irradiation with second light is performed to evaporate the material layer patterned onto a second substrate which is a deposition target substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9627619-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009075214-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9444051-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009104835-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009104403-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8734915-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10101508-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009269485-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009220706-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8153201-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8277871-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8293319-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8283688-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011037095-A1 |
| priorityDate |
2008-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |