| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76826 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02129
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-469
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate |
2009-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2011-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d07bd67e67505068a2efcc0d4997fd85
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ecee85deb040bacd531d6a84d4dadaf4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6a42541e19c5bacc5ea7b2088bf9752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_506fcbc0d0e4847b673fb2f725689c7b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9858ee11013bd4f86b9667f303e64e53 |
| publicationDate |
2011-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7955993-B2 |
| titleOfInvention |
Oxygen plasma reduction to eliminate precursor overflow in BPTEOS film deposition |
| abstract |
A method including providing a semiconductor substrate in a reaction chamber; flowing a first reactant including silicon and oxygen, a boron dopant and a phosphorus dopant into the reaction chamber so that a layer of BPTEOS is deposited on the semiconductor substrate; stopping the flow of the first reactant, boron dopant and phosphorus dopant into the reaction chamber and so that a phosphorus dopant and boron dopant rich film is deposited over the layer of BPTEOS; and reducing the film comprising exposing the film to an O 2 plasma. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017011927-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9455136-B2 |
| priorityDate |
2009-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |