http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7955761-B2

Outgoing Links

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-32
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filingDate 2008-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2011-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_393526b6e2a84d7351fdaa8487196ad8
publicationDate 2011-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7955761-B2
titleOfInvention Exposure mask, pattern formation method, and exposure mask fabrication method
abstract An exposure mask has a rectangular pattern, an auxiliary pattern, a translucent region, and a shielding region. The rectangular pattern includes a transparent region having a dimension equal to or greater than a critical resolution of exposure light. The auxiliary pattern is arranged around the rectangular pattern and includes a transparent region having a dimension smaller than the critical resolution. The translucent region is arranged between the rectangular pattern and the auxiliary pattern for shifting a phase of light transmitted through the rectangular pattern and the auxiliary pattern to an opposite phase. The shielding region is arranged around the auxiliary pattern.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11023651-B2
priorityDate 2007-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 24.