http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7951615-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P90-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B19-41875 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-20 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate | 2009-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_416cc40e685e9d66d3d01030085826c6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9fe8a7293043ce5753efac77044dcc6a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9ca93704e1e882363147478fd3930ff http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd6442ee9a3490a528e57cca0023cfc3 |
| publicationDate | 2011-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7951615-B2 |
| titleOfInvention | System and method for implementing multi-resolution advanced process control |
| abstract | One embodiment is a method for fabricating ICs from a semiconductor wafer. The method includes performing a first process on the semiconductor wafer; taking a first measurement indicative of an accuracy with which the first process was performed; and using the first measurement to generate metrology calibration data, wherein the metrology calibration data includes an effective portion and a non-effective portion. The method further includes removing the non-effective portion from the metrology calibration data and modeling the effective portion with a metrology calibration model; combining the metrology calibration model with a first process model to generate a multi-resolution model, wherein the first process model models an input-output relationship of the first process; and analyzing a response of the multi-resolution model and second measurement data to control performance a second process. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011213478-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8394719-B2 |
| priorityDate | 2009-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.