| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8b4ee13af463c18c765406625e1c5d44 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-89 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61P43-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76814
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76826
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76831
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K31-167
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K31-7048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K45-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-4763 |
| filingDate |
2007-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2011-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e41b06c2ed5827c9355fcec1f0de49eb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66546350ea387a0873e98a3f75f14f7d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_996085ab7953d49966abe59c8b713d74 |
| publicationDate |
2011-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7947579-B2 |
| titleOfInvention |
Method of making dense, conformal, ultra-thin cap layers for nanoporous low-k ILD by plasma assisted atomic layer deposition |
| abstract |
Barrier layers and methods for forming barrier layers on a porous layer are provided. The methods can include chemically adsorbing a plurality of first molecules on a surface of the porous layer in a chamber and forming a first layer of the first molecules on the surface of the porous layer. A plasma can then be used to react a plurality of second molecules with the first layer of first molecules to form a first layer of a barrier layer. The barrier layers can seal the pores of the porous material, function as a diffusion barrier, be conformal, and/or have a negligible impact on the overall ILD k value of the porous material. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10605705-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9273305-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9576848-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10130916-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9989447-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9970000-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10538632-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10947349-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9486742-B1 |
| priorityDate |
2006-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |