Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_063a1b324005ddc15e16e7529c6258c4 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-70 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3121 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 |
filingDate |
2006-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2011-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_921138a4f6e95c855461b80720752020 |
publicationDate |
2011-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7947338-B2 |
titleOfInvention |
Method of forming an interlayer insulating film having a siloxane skeleton |
abstract |
In a method of forming an interlayer insulating film by plasma CVD, an organic siloxane compound including one or more silicon atoms each having at least three or more units each represented by a general formula, —O—Si(R 1 R 2 )—OR 3 (wherein R 1 and R 2 are the same as or different from each other and are a methyl group, an ethyl group or a propyl group, and R 3 is the same as or different from R 1 and R 2 and is a methyl group, an ethyl group, a propyl group or a phenyl group) is used as a raw material. |
priorityDate |
2005-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |