http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7943402-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_99505f5f312672820e9f78c254c00a4d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-26 |
| filingDate | 2010-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e137edee63c541ee00aa6ab52668aaa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5eec0a3d3a921196cc33e93b694c6f4f |
| publicationDate | 2011-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7943402-B2 |
| titleOfInvention | Ion implantation process characterization method |
| abstract | A method of characterizing an ion implantation process, the method including a first step of producing a PN junction degraded by the ion implantation of species, the species implantation being obtained by the ion implantation process to be characterized; a second step of measuring a parameter representative of an electrical conduction of the degraded PN junction and a dispersion of the parameter on a surface on which the degraded PN junction is produced, the parameter and the dispersion forming a reference parameter and a reference dispersion, the first and second steps being repeated in time so as to follow the evolution of the parameter representative of electrical conduction with relation to the reference parameter and the dispersion of the representative parameter with relation to the reference dispersion. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10732307-B2 |
| priorityDate | 2009-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 17.