| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_222758f94ccc9369545661534a704b5e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61N1-36046 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61N1-0543 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61N1-00 |
| filingDate |
2007-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2011-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5e19c939eaba3a36aa9e31ddcea4aef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_baeefe6b0e7bcd6239e6562b662d4b2b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a89ffb5d24c585524be018d41f2b680
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_380b1a240896d491603df819724397a7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad37ca785f9d0cfd73b3d9125b2c619a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36d613ec3cc5bd3c6bbf5ad25cdf9ad2 |
| publicationDate |
2011-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7937153-B2 |
| titleOfInvention |
Electrode with increased stability and method of manufacturing the same |
| abstract |
An implantable electrode with increased stability having a clustered structure wherein the surface of the electrode is covered with a material comprising openings which are filled with sticks or posts. An implantable electrode with increased stability wherein the surface is of the electrode comprises mesh grids which are filled with sticks which are filed with a conducting or insulating material. A method of manufacturing an electrode with increased stability, comprising: depositing a metal layer on an base layer; applying photoresist layer on the metal layer; patterning the photoresist layer providing openings; electroplating the openings with metal; removing the photoresist layer leaving spaces; and filling the spaces with polymer. A method of manufacturing an electrode with increased stability, comprising: depositing a metal layer on an base layer; applying a polymer layer on the metal layer; applying photoresist layer on the polymer layer; patterning the photoresist layer providing openings; electroplating the openings with metal; and removing the photoresist layer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8442641-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019038892-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016067473-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9331791-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8718784-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9198753-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11096614-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9265465-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9370417-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9192464-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9907969-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9265945-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8428740-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11089676-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9474902-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10583285-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10052476-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017246450-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8571669-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8352045-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011208029-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9566191-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8706243-B2 |
| priorityDate |
2006-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |