http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7882780-B2

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bd9a0f38158c4e4e98a1a13bdda45158
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41F1-00
filingDate 2008-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2011-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b4399f1f5b5f49d0c748b08b4a21213
publicationDate 2011-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7882780-B2
titleOfInvention System and method for patterning both sides of a substrate utilizing imprint lithography
abstract Provided are methods and systems for imprinting a pattern formed on surfaces of an imprint mask onto a double-sided substrate. The method includes deforming the surfaces of the first and second imprint stamps to produce respective first and second deformed surfaces, each having an arc therein. A pressure is applied to bring the deformed first and second surfaces into intimate contact with the first and second substrate surfaces, respectively. The applied pressure substantially flattens the deformed surfaces. To separate the two surfaces, the applied pressure is released. The method also includes transporting a substrate having first and second patterning surfaces and a shaped edge using a carrier having a holding portion that holds the shaped edge of the substrate, the holding surface having a shape that is complementary to the shaped edge of the substrate, such that the patterning surfaces remain untouched by the carrier.
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priorityDate 2004-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 53.