| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_063a1b324005ddc15e16e7529c6258c4 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2367-04 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2007-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2011-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ffd4d95806687f693b8c66428fac94e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b6ad5328c4fcc7292965831edd20681 |
| publicationDate |
2011-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7871759-B2 |
| titleOfInvention |
Barrier film material and pattern formation method using the same |
| abstract |
A resist film is formed on a substrate, and a barrier film including a compound whose alkali-insoluble property is changed to an alkali-soluble property through molecular structure change caused by an alkaline solution is formed on the resist film. Thereafter, with an immersion liquid provided on the barrier film, pattern exposure is performed by selectively irradiating the resist film through the barrier film with exposing light. After the pattern exposure, the barrier film is removed and the resist film is developed. Thus, a resist pattern made of the resist film is formed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8679727-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010021703-A1 |
| priorityDate |
2007-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |