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filingDate 2008-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2010-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2010-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7842916-B2
titleOfInvention Method of and apparatus for analyzing ions adsorbed on surface of mask
abstract A method of analyzing ions adsorbed on a surface of a mask for pattern formation of a semiconductor device, and an apparatus using the same are disclosed. The ion analyzing method includes: filling a heating container within a main chamber with a predetermined amount of a solvent; immersing a mask in the solvent-filled heating container; raising an internal pressure of the chamber to a predetermined level by supplying gas into the chamber; separating ions from a surface of the mask by heating the solvent within the heating container at a predetermined temperature for a predetermined period; and analyzing the ions by collecting the solvent.
priorityDate 2007-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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