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grantDate 2010-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2010-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7834206-B2
titleOfInvention Organic-metal precursor material and method of manufacturing metal thin film using the same
abstract Provided are an organic-metal precursor material that can be readily decomposed without reacting with an oxidant, a method of manufacturing a metal thin film using the organic-metal precursor material, and a metal thin film prepared using the organic-metal precursor material. The organic-metal precursor material is an organic molecule having lone-pair electrons selected from the group consisting of ether, amine, tetrahydrofuran (THF), a phosphine group, and a phosphite group, and has a structure of covalent coordination bond.
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