http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7820596-B2

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L39-24
filingDate 2001-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2010-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f07a34bfb171b6cf54ae8bb55767d1a
publicationDate 2010-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7820596-B2
titleOfInvention Thick film high temperature superconducting device supporting high critical currents and method for fabricating same
abstract A thick film superconductor includes a substrate and a superconducting thick film formed on the substrate. The thick film is 1-20 microns thick with an average twin spacing to film thickness ratio of about 0.016, and is formed from an aqueous solution of YBC ions doped with a particulate rare earth oxide having a diameter of about 50-500 nm. The coated substrate is heat treated, preferably above 650 degrees C. and cooled at a rate less than 15 degrees C. per hour, resulting in a substantially fully oxygenated YBCO layer.
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