Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B41-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1454 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B69-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
filingDate |
2007-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2010-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7ecc22f958bd454bddc99a3a028690c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34af8b76b2f23c31423426a83614acf9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78c0c09f7c17c03ccd2166c994e65a7e |
publicationDate |
2010-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7799687-B2 |
titleOfInvention |
Slurry composition for a chemical mechanical polishing process and method of manufacturing a semiconductor device using the slurry composition |
abstract |
A slurry composition for a chemical mechanical polishing process and a method of manufacturing a semiconductor memory device using the slurry composition are provided. The slurry composition may include about 0.001 percent by weight to about 5 percent by weight of a ceria abrasive, about 0.001 percent by weight to about 0.1 percent by weight of a nonionic surfactant adsorbed onto a polysilicon layer forming a passivation layer on the polysilicon layer, the nonionic surfactant having a chemical structure of a triblock copolymer including a first polyethylene oxide block, a polypropylene oxide block and a second polyethylene oxide block and a remainder of water. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8822339-B2 |
priorityDate |
2006-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |