http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7799512-B2

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b2d32a1324eb3a240649ffee8d475d63
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
filingDate 2007-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2010-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b1dd2be2cf235f80fc10d90c1e975db
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24ee54debb631e3eaf3b8d68eea06a4c
publicationDate 2010-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7799512-B2
titleOfInvention Method for forming ring pattern
abstract A method for forming a ring pattern is disclosed. The ring pattern has a first wall and a second wall. The method includes the following steps: (a) providing a substrate; (b) forming a dielectric layer on the substrate; (c) forming a first patterned photoresist layer on the dielectric layer, the first patterned photoresist layer defining the first wall; (d) etching the dielectric layer to a predetermined depth by using the first patterned photoresist as a mask, and then removing the first patterned photoresist layer; (e) forming a second patterned photoresist layer on the dielectric layer, the second patterned photoresist layer defining the second wall; (f) etching the dielectric layer by using the second patterned photoresist layer as a mask so as to form the ring pattern having the first wall and the second wall.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10832910-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10312086-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9786504-B1
priorityDate 2007-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6573030-B1
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http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454436140
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID297

Total number of triples: 21.