| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_69bddb4c84704857f70d926c31a6e1a2 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61N1-3975
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61N1-3968 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01G9-055
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01G9-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01G9-012
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01G9-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01G4-228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K5-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01G9-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01G9-145
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01G9-04 |
| filingDate |
2008-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2010-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_373305ca237a4cdb1f13f86b68cad46a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4aaa8fe1a51c15371b5022d782a7da9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_352f59b467981cbd909fcff94008a462
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2945ae9b3ffe190c3235f1c08c9cc94a |
| publicationDate |
2010-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7768772-B2 |
| titleOfInvention |
Method and apparatus for providing flexible partially etched capacitor electrode interconnect |
| abstract |
The present subject matter includes a capacitor stack disposed in a case, the capacitor stack including one or more substantially planar electrode layers. The one or more substantially planar electrode layers have an etched surface, an unetched surface, and a grade bordering the etched surface and the unetched surface. Also, the present subject matter includes a lid conforming sealingly connected to the material defining the first aperture. Additionally, the present subject matter includes a feedthrough assembly connected to the capacitor stack and passing through the feedthrough hole and sealingly connected to the material defining the feedthrough hole. In the present subject matter, the one or more substantially planar electrode layers are made by printing a curable resin mask onto the one or more substantially planar electrode layers and etching the layers, the curable resin mask defining the grade and adapted to resist etching. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009059472-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8744575-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8587102-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9911542-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010095496-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8619408-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8174818-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8451587-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8406882-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10032565-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9443660-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8543201-B2 |
| priorityDate |
2004-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |