| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3d52eacd83e723ebd2ca61b598586c2 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B2219-37224
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P90-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B2219-45031 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B19-41875 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N37-00 |
| filingDate |
2008-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2010-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_416b1ea0d1db3e77163f7f7c661b57d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ab14a9887aabad4d3b72e2e36a1348a |
| publicationDate |
2010-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7756658-B2 |
| titleOfInvention |
Systems and methods for detecting defects on a wafer and generating inspection results for the wafer |
| abstract |
Systems and methods for detecting defects on a wafer and generating inspection results for the wafer are provided. One method includes detecting defects on a wafer by comparing output generated by scanning of the wafer performed by an inspection system to one or more defect detection thresholds. The method also includes sampling outliers in the output by selecting the output having the highest values from bins defined based on one or more predetermined criteria. In addition, the method includes selecting a portion of the sampled outliers based on wafer-level analysis of the sampled outliers. The method further includes generating inspection results for the wafer by combining information about the selected portion of the sampled outliers with information about the defects detected using the one or more defect detection thresholds. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10977090-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9607233-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11496415-B2
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009310884-A1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11494235-B2
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9858658-B2
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015043804-A1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8755041-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9595091-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11467883-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11650857-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7885478-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11652706-B2 |
| priorityDate |
2008-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |