| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D5-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-12 |
| filingDate |
2004-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2010-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1157189812dff2c5aa777e29c5dac7a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b2e42c28c908b35f0a5d9463d09d848
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c5ab07f6404b0a373984f6e92e25bdd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ebe03b00496ac25a8646bed1002f52fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa889be8c5a79e001656496ade08588f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a3b625a476a236c3434590e586a866f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17dbd991f5a13561581e06c58f7cce0f |
| publicationDate |
2010-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7744946-B2 |
| titleOfInvention |
Organic siloxane resins and insulating film using the same |
| abstract |
The present invention relates to organic siloxane resins and insulating films using the same. The insulating films are manufactured by using organic siloxane resins, wherein organic siloxane resins are hydrolysis-condensation polymers of silane compounds comprising one or more kinds of hydrosilane compounds. They have superior mechanical properties and a low electric property, and therefore, are properly usable for highly integrated semiconductor devices. |
| priorityDate |
2003-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |