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filingDate 2008-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2010-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2010-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7713753-B2
titleOfInvention Dual-level self-assembled patterning method and apparatus fabricated using the method
abstract A method of fabricating a device includes: providing a substrate having a patterned surface, depositing a first-level self-assembled material on at least a portion of the patterned surface, wherein the position and/or orientation of the first-level self-assembled material is directed by the patterned surface, to form a first nanostructure pattern, and depositing a second-level self-assembled material on at least a portion of the first nanostructure pattern to form an array of nanostructures of the second-level self-assembled material. An apparatus fabricated using the method is also provided.
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