Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_063a1b324005ddc15e16e7529c6258c4 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-26513 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-268 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2658 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-20 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-26 |
filingDate |
2004-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2010-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90d214ddbc33790cb504c1c1ec564684 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e7ced39ca4590e6fcb5266c14b142c72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_104635bafb65d8a2624fed9b88db630f |
publicationDate |
2010-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7700382-B2 |
titleOfInvention |
Impurity introducing method using optical characteristics to determine annealing conditions |
abstract |
A subject of the present invention is to realize an impurity doping not to bring about a rise of a substrate temperature. n Another subject of the present invention is to measure optically physical properties of a lattice defect generated by the impurity doping step to control such that subsequent steps are optimized. n An impurity doping method, includes a step of doping an impurity into a surface of a solid state base body, a step of measuring an optical characteristic of an area into which the impurity is doped, a step of selecting annealing conditions based on a measurement result to meet the optical characteristic of the area into which the impurity is doped, and a step of annealing the area into which the impurity is doped, based on the selected annealing conditions. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009035878-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008050895-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8304261-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I557780-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011165703-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8563431-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009093071-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9704712-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7927892-B2 |
priorityDate |
2003-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |