| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_082507838ffd3a482218a2d116731fbd |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate |
2007-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2010-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee8a36bc20041ceea73971ba27650c89
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14761f078d91af51de23166579c11788
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72abc180607b1b7b60c2650de55c75da
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_974854cef41cbcf367f33f89a6689c25 |
| publicationDate |
2010-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7696095-B2 |
| titleOfInvention |
Auto-stopping slurries for chemical-mechanical polishing of topographic dielectric silicon dioxide |
| abstract |
The present invention provides auto-stopping CMP slurry compositions that minimize post-CMP non-uniformity and also extend the time that polishing can be continued beyond the end point without the risk of over-polishing the dielectric silicon dioxide film. Auto-stopping CMP slurry compositions according to the invention include ceria abrasive particles and an effective amount of a polyalkylamine such as polyethyleneimine dispersed in water. The methods of the invention include polishing a topographic dielectric silicon dioxide film layer using the auto-stopping CMP slurry compositions to obtain a dielectric silicon dioxide surface having a desired predetermined minimum step height. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8314028-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11037795-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012235081-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10392531-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008081542-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10544332-B2 |
| priorityDate |
2007-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |