| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a106545a5f310868984690169500abd4 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-301
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S428-913
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-12431
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61F2002-91541
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L2400-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-125 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L27-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61F2-915
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61F2-91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L29-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L31-088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L31-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L27-047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L27-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L31-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L27-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L27-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61F2-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L27-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01F3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L31-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61F2-90 |
| filingDate |
2007-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2010-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7056c15d0f4d9dcd1c1b6733b8b5c9d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d15a90a7c331317f94a44fe9979887c2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_186d7c0025ce60d7257cef708dff0000
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d918760a4501768cfa34b4182b55ccb |
| publicationDate |
2010-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7670690-B2 |
| titleOfInvention |
High strength vacuum deposited nitinol alloy films and method of making same |
| abstract |
A vacuum deposition method for fabricating high-strength nitinol films by sputter depositing nickel and titanium from a heated sputtering target, and controlling the sputter deposition process parameters in order to create high-strength nitinol films that exhibit shape memory and/or superelastic properties without the need for precipitation annealing to attenuate the transition conditions of the deposited material. A vacuum deposited nitinol film having high-strength properties equal to or better than wrought nitinol films and which are characterized by having non-columnar crystal grain structures. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8894824-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006004466-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11094476-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10373767-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005288773-A1 |
| priorityDate |
1999-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |