| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aafe0172ffd94d3486c518b0709bb2b3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K2323-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K2323-059 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13394
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13 |
| filingDate |
2007-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2010-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3d1992c1baffc342027d62b8c296125
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b6deaf0e3c5b35bd352bd52be0efcab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_818f96a4cd96580820464b34c163ce30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a043d544b5f0e754645935f17a0053b |
| publicationDate |
2010-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7662448-B2 |
| titleOfInvention |
Photosensitive resin composition for column spacers for liquid crystal display device, column spacers formed using the composition and display device comprising the column spacers |
| abstract |
A photosensitive resin composition for forming column spacers for a liquid crystal display device is provided. The composition includes an alkali-soluble resin, a reactive unsaturated compound, a photoinitiator and a solvent. The alkali-soluble resin includes structural units represented by Formulae 1, 2 and 3, which are described in the specification. A pattern formed using the composition is also provided. The pattern shows improved thickness uniformity, good developability without leaving any residual image, superior solvent resistance and high recovery rate. |
| priorityDate |
2006-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |