| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate |
2005-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2010-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0171e57944c3fb2e867c1715a5fe609d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_622e91a459ad222f2e6f4233a88a90b1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab6d1687e26e780aefa9c02d61cd3011
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_506cff226439a14dfc8e26bab6c49209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca78dc6711c45b55afd2391a4544809c |
| publicationDate |
2010-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7645707-B2 |
| titleOfInvention |
Etch profile control |
| abstract |
A method for etching a dielectric layer over a substrate and disposed below a mask is provided. The substrate is placed in a plasma processing chamber. An etchant gas comprising O 2 and a sulfur component gas comprising at least one of H 2 S and a compound containing at least one carbon sulfur bond is provided into the plasma chamber. A plasma is formed from the etchant gas. Features are etched into the etch layer through the photoresist mask with the plasma from the etchant gas. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10872784-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9460935-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10115600-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010108264-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8394722-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10546756-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9773679-B2 |
| priorityDate |
2005-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |