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filingDate 2005-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2010-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7642038-B2
titleOfInvention Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus
abstract To provide a display device which can be manufactured with higher efficiency in the use of material through a simplified manufacturing process, and a method for manufacturing the display device. Another object is to provide a technique by which patterns of a wiring the like which constitutes the display device can be formed to a desired shape with good control. In a method for forming a pattern according to the present invention, a mask is formed over a light-transmitting substrate; a first region including a photocatalyst is formed over the substrate and the mask; the photocatalyst is irradiated with light through the substrate to modify a part of the first region; a second region is formed; and a composition containing a pattern forming material is discharged to the second region, thus, a pattern is formed. The mask does not transmit light.
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