| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9dc97386b2da19761bd29d352e38258b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-73 |
| filingDate |
2005-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_efd404529dc99c9c36169d654de7166e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4eff7970530ccb735da16d08d39ed21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_241f7e4e9095ff20334dc79f5eba7998 |
| publicationDate |
2009-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7615338-B2 |
| titleOfInvention |
Photoresist coating composition and method for forming fine pattern using the same |
| abstract |
A photoresist coating composition that includes a compound represented by Formula 1 and an aqueous solvent, and a method for forming a fine pattern by coating the composition on a photoresist pattern to effectively reduce a size of a photoresist contact hole and a space, which can be applied to all semiconductor processes. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008038916-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8003537-B2 |
| priorityDate |
2005-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |