| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate |
2004-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9941581b3abecf6f3e1031606e4d862
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b36d5560e7016de73dab894ea7a9050
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eee565e0921f3f7c3d4efebf21724b53 |
| publicationDate |
2009-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7611825-B2 |
| titleOfInvention |
Photolithography method to prevent photoresist pattern collapse |
| abstract |
A method comprises forming a BARC layer on a substrate, treating the BARC layer to make its surface hydrophilic, forming a photoresist layer on the treated BARC layer, exposing the photoresist layer to a predetermined pattern, and developing the photoresist layer to form patterned photoresist. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8026024-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009233190-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8533638-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012258386-A1 |
| priorityDate |
2004-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |