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filingDate 2005-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2009-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5598150980d636ed46937648bf92f8d
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publicationDate 2009-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7605392-B2
titleOfInvention Field effect transistor and production process thereof
abstract There is provided a field effect transistor including a substrate, an organic semiconductor layer 6 , an insulating layer 3 , and a conductive layers 2, 4 , and 5 , wherein the insulating layer 3 comprises a cured product of a phenol resin represented by the following general formula (1): n n(R 1 , R 2 and R 3 each represent hydrogen atom, halogen atom, hydroxymethyl group, alkyl group having 1 to 12 carbon atoms, alkenyl group, alkinyl group, alkoxyl group, alkylthio group, or alkyl ester group, X 1 and X 2 each represent hydrogen atom, alkyl group having 1 to 12 carbon atoms, alkenyl group, alkinyl group, or aryl group, and n represents an integer of 0 to 2,000.) According to the present invention, a field effect transistor capable of smoothening the gate electrode having a low surface smoothness, in which a current leak to the gate electrode is small can be obtained.
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