| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-252
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2201-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-166
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-249969
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2201-23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2201-11 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1453
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C10-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-112
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N23-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B18-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B17-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-16 |
| filingDate |
2006-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5aacaa1928cc97cf6aea6a652b17d319
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6c27c179610fef7e678f256be168af2 |
| publicationDate |
2009-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7592063-B2 |
| titleOfInvention |
Quartz glass substrate and process for its production |
| abstract |
For a substrate having fine convexoconcave patterns on its surface, the dimensions of the convexoconcave patterns in a vertical direction of a quartz glass substrate are controlled to be uniform with extreme accuracy and over the entire substrate surface. The quartz glass substrate is made to have a fictive temperature distribution of at most 40° C. and a halogen concentration of less than 400 ppm, and the etching rate of the surface of the quartz glass substrate is made uniform, whereby the dimensions of the convexoconcave patterns in a vertical direction of the quartz glass substrate are controlled to be uniform with good accuracy and over the entire substrate surface. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10370281-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011089612-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8039409-B2 |
| priorityDate |
2006-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |