| abstract |
A polarimetric imaging system employs a pixel pitch matched filter for use within, for example, a 2 by 2 pixel neighborhood, in which one pixel samples the scene via a 0 degree polarization filter and a second pixel samples the scene via a 45 degree polarization filter. The remaining two pixels record the intensity of the light within the 2 by 2 neighborhoods. The polarization filters employ organic materials such as polymers or metallic materials that are patterned and etched using reactive ion etching (RIE) or other appropriate etching technique in order to create 14 micron or smaller circular (or square) periodic structures that are patterned into polarization thin films that are deposited on an imaging sensor that includes a processor that computes from the polarization-filtered inputs the first three Stokes parameters in real-time. |