| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5a231330b7870ecb6f078b3b535ed010 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q80-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q10-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q30-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y35-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2007-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_157c58bc90c3f15485da57f27eab05a1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c97ea34736d2b72dbbe9b1e8c976e4e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7417b5a6ee47af5dbde66c92520afe3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_840bedd7917330e763799f11bfe8cd4a |
| publicationDate |
2009-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7571639-B2 |
| titleOfInvention |
Method of correcting opaque defect of photomask using atomic force microscope fine processing device |
| abstract |
An opaque defect is processed by scanning with a high load or height fixed mode using a probe harder than a pattern material of a photomask at the time of going scanning, and is observed by scanning with a low load or intermittent contact mode at the time of returning scanning so as to detect an ending point of the opaque defect by the height information. When there is a portion reaching to a glass substrate as an ending point, this portion is not scanned by the high load or height fixed mode in the next processing, and only a portion not reaching to the ending point is scanned by the high load or height fixed mode. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9086639-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102011004214-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8769709-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012110602-A1 |
| priorityDate |
2006-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |