| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-001
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B6-138 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate |
2008-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9b710a9d389b9cfb685e33610b67be4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_062182e4de3fa2e7a9bdc4ca2e96af8b |
| publicationDate |
2009-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7569335-B2 |
| titleOfInvention |
Photosensitive resin composition for optical waveguides, and optical waveguide and manufacturing method thereof |
| abstract |
There is provided a photosensitive resin composition for forming an optical waveguide which has high shape precision and excellent transmission characteristics under high temperature and high humidity. A composition of the present invention contains (A) a polymer having structures represented by the following general formulae (I) and (2) n n(in the formulae, each of R 1 and R 2 is independently a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R 3 is an organic group containing a radical-polymerizable reactive group; X is a single bond or a bivalent organic group; and Y is a non-polymerizable organic group), (B) a compound having at least one ethylenic unsaturated group in the molecule thereof, having a molecular weight below 1,000 and having a boiling point of at least 130° C. at 0.1 MPa, and (C) a photoradical polymerization initiator. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016252811-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8513350-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9696621-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009191386-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010199491-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008207807-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017057853-A1 |
| priorityDate |
2004-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |