| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-402
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-151 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-825 |
| filingDate |
2006-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2e32734b9731c036f87470dbbfa3290
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3a63ff0cf1f0fb761f1fa811fc43fa7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88ee237348ddf794ea55454180289a13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7c9f34de12969c5f3eca8e5864a066f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e4ce3577dc463e1fd3be6a780a2780c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07cac9b554acfa77d844e5b5e64742f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e38fcfc980e9886c6507ec44505947f8 |
| publicationDate |
2009-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7563563-B2 |
| titleOfInvention |
Wet developable bottom antireflective coating composition and method for use thereof |
| abstract |
The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010022092-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8227172-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011111339-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8323868-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9040225-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8999624-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9523917-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9354519-B2 |
| priorityDate |
2006-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |