| abstract |
A method, system, and apparatus, the method including, in some embodiments, applying a via filling material in a film format and at a first temperature to a backside of a silicon wafer having a plurality of vias therein, heating the via filling material to a second temperature to cause the via filling material to flow into and fill the plurality of vias, and applying a die attach material over the plurality of vias filled with the via filling material. |