Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32688 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3408 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25B13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-34 |
filingDate |
2004-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2009-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e257fc16fa68a2d3acd6c9a368b5a3b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b87f800462396f0e6b6247d3ed6d3025 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4692bad00fccf79ab677c25b856a199c |
publicationDate |
2009-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7527713-B2 |
titleOfInvention |
Variable quadruple electromagnet array in plasma processing |
abstract |
A quadruple electromagnetic coil array coaxially arranged in a rectangular array about a chamber axis outside the sidewalls of a plasma sputter reactor, preferably in back of an RF coil within the chamber. The coil currents can be separately controlled to produce different magnetic field distributions, for example, between a sputter deposition mode in which the sputter target is powered to sputter target material onto a wafer and a sputter etch mode in which the RF coil supports the gas sputtering the wafer. The coil array may include a tubular magnetic core, particularly useful for suppressing stray fields. A water cooling coil may be wrapped around the coil array to cool all the coils. The electromagnets can be powered in different relative polarities in a multi-step process. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022159596-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102071403-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8871064-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9831074-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9005413-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015114823-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013206725-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105088176-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010155223-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012103801-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012097527-A1 |
priorityDate |
2004-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |