http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7527713-B2

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filingDate 2004-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2009-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7527713-B2
titleOfInvention Variable quadruple electromagnet array in plasma processing
abstract A quadruple electromagnetic coil array coaxially arranged in a rectangular array about a chamber axis outside the sidewalls of a plasma sputter reactor, preferably in back of an RF coil within the chamber. The coil currents can be separately controlled to produce different magnetic field distributions, for example, between a sputter deposition mode in which the sputter target is powered to sputter target material onto a wafer and a sputter etch mode in which the RF coil supports the gas sputtering the wafer. The coil array may include a tubular magnetic core, particularly useful for suppressing stray fields. A water cooling coil may be wrapped around the coil array to cool all the coils. The electromagnets can be powered in different relative polarities in a multi-step process.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012103801-A1
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Total number of triples: 41.