| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S134-902
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-905 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B9-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate |
2004-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5279bc0ae1450de664f316da3f097499
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_244e5a1a241ab395eaaea920bb63fdd4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_232e7b6268f48c6a223d2eb61dba2eea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7cb5bf81e331188c23d218b365857d18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ffca09cc8ccb4a1810656576ba25224 |
| publicationDate |
2009-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7506654-B2 |
| titleOfInvention |
Accelerated plasma clean |
| abstract |
A method and apparatus that reduces the time required to clean a processing chamber employing a reactive plasma cleaning process. A plasma is formed in an Astron fluorine source generator from a flow of substantially pure inert-source gas. After formation of the plasma, a flow of a fluorine source gas is introduced therein such that the fluorine source flow accelerates at a rate no greater than 1.67 standard cubic centimeters per second 2 (scc/s 2 ). In this fashion, the plasma contains a plurality of radicals and dissociated inert-source gas atoms, defining a cleaning mixture. The ratio of inert-source gas to fluorine source is greater than 1:1. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11177136-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10453694-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11574831-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10943788-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012222699-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8992689-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11171008-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10566205-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10468282-B2 |
| priorityDate |
1999-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |