| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-849
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-85
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-857
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-855
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-851
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q80-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01Q60-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01Q80-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-06 |
| filingDate |
2004-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2acf06798c3b8c6ecd266b54a782c561
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e518f8fff6c22fa964dc5636a0b403a7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5104074db151a4d9bcc9b298880437c8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75e217537457d1f8412190a13e3fafe3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_806fc06a96c2a67ffd8e1896f36c8136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc56cb48fa2acfff207a345b169da784
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d070f681972ecb59ff60deee16bab1b |
| publicationDate |
2009-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7491425-B2 |
| titleOfInvention |
Scanning probe-based lithography method |
| abstract |
A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally reversible crosslinkages. Also disclosed is a method that generally includes scanning a surface of the polymer resist layer with an AFM probe positioned in contact with the resist layer, wherein heating the probe and a squashing-type mechanical action of the probe produces features in the layer by thermally reversing the crosslinkages. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8387160-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2610782-C1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011020533-A1 |
| priorityDate |
2004-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |