| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cdd94f212dc7aef02fc1dcf28fa9b4fd |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H2240-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H2245-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2201-30469
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B2202-02 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2406
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B32-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B32-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B32-158
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D01F9-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B32-159 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D01F9-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B31-02 |
| filingDate |
2004-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a602ba55b7a8a4b761a7e27ffbc5e703 |
| publicationDate |
2009-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7485348-B2 |
| titleOfInvention |
Method for forming nanostructured carbons, nanostructured carbons and a substrate having nanostructured carbons formed thereby |
| abstract |
A method for forming nanostructured carbons comprising the steps of: generating a plasma by supplying at least a discharge gas between opposing electrodes and applying a high-frequency voltage between the electrodes under an approximately atmospheric pressure; existing a material gas for forming the nanostructured carbons with the plasma to generate an activated material gas; and exposing a substrate to the activated material gas. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2279986-A2 |
| priorityDate |
2003-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |