| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd83260a96356882b5f50dd097411a72 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76807
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate |
2004-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df3f7100dab560c56af617086d9359fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_400c2f41c9041c626922c328719b07f1 |
| publicationDate |
2009-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7479361-B2 |
| titleOfInvention |
Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process |
| abstract |
An objective of this invention is to prevent resist poisoning and sensitivity deterioration in a chemically amplified resist. The chemically amplified resist comprises a base resin, a photoacid generator and a salt exhibiting buffer effect in the base resin. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3182203-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9477150-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7534554-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8415091-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2998297-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010304299-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8323866-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010009289-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8202680-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008233518-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9709886-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010021843-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9034557-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10527934-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8158338-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011183273-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8597870-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9383644-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8802354-B2 |
| priorityDate |
2003-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |