http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7468235-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate | 2006-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1df85eaaecb43cea07de301f902d62d2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ede11f3f0a6be01367aab144c71e9df6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8442487dedc1b0ee92cb1df51113bc02 |
| publicationDate | 2008-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7468235-B2 |
| titleOfInvention | Barrier coating compositions containing fluorine and methods of forming photoresist patterns using such compositions |
| abstract | Provided are a barrier coating composition and a method of forming photoresist pattern by an immersion photolithography process using the same. The barrier coating composition includes a polymer corresponding to formula I having a weight average molecular weight (Mw) of 5,000 to 100,000 daltons and an organic solvent, n nwherein the expressions 1+m+n=1; 0.1≦1/(1+m+n)≦0.7; 0.3≦m/(1+m+n)≦0.9; and 0.0≦n/(1+m+n)≦0.6 are satisfied; Rf is a C 1 to C 5 fluorine-substituted hydrocarbon group; and Z, if present, includes at least one hydrophilic group. Compositions according to the invention may be used to form barrier layers on photoresist layers to suppress dissolution of photoresist components during immersion photolithography while allowing the barrier layer to be removed by alkaline developing solutions. |
| priorityDate | 2005-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 75.