http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7442407-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0bcb8c1e0f2d59052e7e92678b576c47 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-12528 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F9-005 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D5-12 |
| filingDate | 2006-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eafbcaf5c8ee9d40702da4611566c151 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67b26bb0b4d7a9e78a3b5bf1cff2f482 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_deef91ab3ac8facb91f451f6cddc1296 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44bdb8f3c43760f9958aca030d562b74 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79a36496ebdb7ea08820b07c54c4f57c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2be3e9e6a194d07feffc3892d16abb0f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c6fa5e0f60d0a90cf7b28f5e127c1c1 |
| publicationDate | 2008-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7442407-B2 |
| titleOfInvention | Tantalum and niobium compounds and their use for chemical vapour deposition (CVD) |
| abstract | Tantalum and niobium compounds having the general formula (I) and their use for the chemical vapour deposition process are described: n nwhereinn M stands for Nb or Ta, R 1 and R 2 C 1 to C 12 alkyl, C 5 to C 12 cycloalkyl, C 6 to C 10 aryl radicals, 1-alkenyl, 2-alkenyl, 3-alkenyl, triorganosilyl radicals —SiR 3 , or amino radicals NR 2 R 3 is C 1 to C 8 alkyl, C 5 to C 10 cycloalkyl, C 6 to C 14 aryl radical, or SiR 3 or NR 2 , R 4 denotes Cl, Br, I, NIH—R 5 where R 5 is C 1 to C 8 alkyl, C 5 to C 10 cycloalkyl or C 6 to C 10 aryl radical, or O—R 6 where R 6 =optionally substituted C 1 to C 11 alkyl, C 5 to C 10 cycloalkyl, C 6 to C 10 aryl radical, or —SiR 3 , or BH 4 , or an allyl radical, or an indenyl radical, or an benzyl radical, or an cyclopentadienyl radical, or —NIR—NR′R″ (hydrazido(-1), wherein R, R′ and R″ have the aforementioned meaning of R, or CH 2 SiMe 3 , pseudohalide, or silylamide —N(SiMe 3 ) 2 , and R 7 and R 8 are H, C 1 to C 12 alkyl, C 5 to C 12 cycloalkyl or C 6 to C 10 aryl radicals. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11015241-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11524973-B2 |
| priorityDate | 2005-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 226.