| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36f8253f3d0d59bcd9259217d4385d10 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-835
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-494
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-825
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate |
2005-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f9d76549ee448b7df8679effef0f40f |
| publicationDate |
2008-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7405028-B2 |
| titleOfInvention |
Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography |
| abstract |
A bottom antireflective coating for photolithography at 157 nm or less, where the bottom antireflective coating includes a crosslinkable polymer which contains cinnamic acid derivatives. |
| priorityDate |
2004-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |