| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_31b1220216408a6076f55e0ba4ec1003 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T156-1168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-977
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S156-922
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T156-1989
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T156-1189
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T156-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T156-1994
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T156-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T156-1064 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76259
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76254 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B38-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B37-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-762 |
| filingDate |
2006-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0c5c34ab867c8372e6b69f248b82614
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa0d64d25aae3b980f37bfa0d778ce6d |
| publicationDate |
2008-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7404870-B2 |
| titleOfInvention |
Methods for forming an assembly for transfer of a useful layer |
| abstract |
Methods for transferring of a useful layer from a support are described. In an embodiment, the method includes for facilitating transfer of a useful layer from a support by providing an interface in a first support to define a useful layer; and forming a peripheral recess on the first support below the interface so that the periphery of the interface is exposed to facilitate removal and transfer of the useful layer. An epitaxial layer can be formed on the useful layer after forming the recess, with the width and depth of the recess being sufficient to accommodate the volume of residual material resulting from formation of the epitaxial layer without covering the periphery of the interface. Alternatively, an epitaxial layer can be formed on the useful layer after forming the recess, wherein the peripheral recess is configured for receiving sufficient residual material from the epitaxial layer to prevent bonding between the residual material and the useful layer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009294804-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007193062-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7654010-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011317050-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7982277-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8748316-B2 |
| priorityDate |
2003-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |