Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-35 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-221 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-56 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-00 |
filingDate |
2003-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2008-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8249187f95d6633d6060ec354a325675 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_820b217ab6b982db17332fcf75318a24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5976e9fffc7cc49de037ff91711d5e4e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d750b0b302934ecf3a4bd20c0dd70b34 |
publicationDate |
2008-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7396269-B2 |
titleOfInvention |
Method for fabricating organic EL element |
abstract |
The main object of the present invention is to provide a method for manufacturing an EL element, capable of preventing deterioration of the element characteristic by the developing agent or the rinsing agent, while providing the advantages of the photolithography method of high light emitting efficiency and taking out efficiency, the manufacturing process simplicity, and the highly sophisticated pattern formation. In order to achieve the above mentioned object, the present invention provides a method for manufacturing an organic EL element comprising at least a patterned organic light emitting layer, wherein the patterning is conducted by etching with a protecting layer pattern laminated on an organic light emitting layer. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10325970-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008124824-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7947518-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8021203-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I771887-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008258616-A1 |
priorityDate |
2002-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |