| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-55
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2201-1222
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2201-129
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-8416 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-8422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32972 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01L21-30 |
| filingDate |
2004-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_616546097db16167788b98db32f9de8c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d06ce2c90e9f239f9b0e27dfef5518db
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3643c329432de8535ec62bad0ad1d8b8 |
| publicationDate |
2008-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7393459-B2 |
| titleOfInvention |
Method for automatic determination of substrates states in plasma processing chambers |
| abstract |
A method for automatic determination of a state of a substrate in a plasma processing chamber is provided. Substrate reflectance data is collected in a processing chamber prior to processing to be analyzed with reference reflectance data to determine if the substrate state meets a control criterion. The substrate state may define the thickness and the qualities of the films on the substrate, the critical dimensions of the different layers on the substrate. The reflectance data is analyzed using a multi-variant analysis technique, such as principle component analysis. In addition to analyzing substrate state prior to processing, substrate reflectance could also be collected in a processing chamber during processing to be analyzed with reference reflectance data to further determine if the substrate state and/or the substrate processing are meeting a control criterion. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8954186-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009275265-A1 |
| priorityDate |
2004-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |