| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3bf3161f266d1eb9a985f343d99bf0ef |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2033-0095 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q60-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-00 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B5-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-00 |
| filingDate |
2006-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_decad5b2e58676a1a81d4dbf896893db
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac509c150500d582d49c7a077478a109 |
| publicationDate |
2008-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7379826-B2 |
| titleOfInvention |
Semiconductor wafer inspection system |
| abstract |
A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential difference data and processing that data to identify a pattern characteristic of the defect or contamination. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8731274-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012195490-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008319568-A1 |
| priorityDate |
2003-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |